- All sections
- C - Chemistry; metallurgy
- C23C - Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
- C23C 16/18 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the deposition of metallic material from metallo-organic compounds
Patent holdings for IPC class C23C 16/18
Total number of patents in this class: 1000
10-year publication summary
|
65
|
69
|
79
|
85
|
57
|
76
|
68
|
115
|
94
|
20
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Applied Materials, Inc. | 16587 |
94 |
| L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude | 3515 |
67 |
| Adeka Corporation | 1333 |
63 |
| ASM IP Holding B.V. | 1715 |
56 |
| Tokyo Electron Limited | 11599 |
53 |
| Tanaka Kikinzoku Kogyo K.K. | 589 |
43 |
| Entegris, Inc. | 1736 |
32 |
| Up Chemical Co., Ltd. | 55 |
22 |
| Versum Materials US, LLC | 591 |
21 |
| Merck Patent GmbH | 5909 |
20 |
| BASF SE | 19740 |
19 |
| American Air Liquide, Inc. | 223 |
19 |
| Umicore AG & Co. KG | 867 |
18 |
| Tosoh Corporation | 1127 |
17 |
| Commissariat à l'énergie atomique et aux energies alternatives | 10525 |
15 |
| Hansol Chemical Co., Ltd. | 90 |
15 |
| Wayne State University | 655 |
14 |
| Lam Research Corporation | 4775 |
13 |
| Samsung Electronics Co., Ltd. | 131630 |
10 |
| Dnf Co.,Ltd. | 63 |
10 |
| Other owners | 379 |